Download PDF by Tommi Kääriäinen,David Cameron,Marja-Leena Kääriäinen,Arthur: Atomic Layer Deposition: Principles, Characteristics, and

By Tommi Kääriäinen,David Cameron,Marja-Leena Kääriäinen,Arthur Sherman

because the first variation used to be released in 2008, Atomic Layer Deposition (ALD) has emerged as a strong, and infrequently most well-liked, deposition expertise. the hot variation of this groundbreaking monograph is the 1st textual content to check the topic of ALD comprehensively from a pragmatic point of view. It covers ALD's program to microelectronics (MEMS) and nanotechnology; many vital new and rising purposes; thermal approaches for ALD progress of nanometer thick movies of semiconductors, oxides, metals and nitrides; and the formation of natural and hybrid materials.

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Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications by Tommi Kääriäinen,David Cameron,Marja-Leena Kääriäinen,Arthur Sherman


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